SPIE Advanced Lithography + Patterning San Jose USA 2025 is a leading international conference and exhibition that brings together researchers, engineers, and industry leaders to explore the latest advancements in micro/nanofabrication technologies. Held annually, this prestigious event provides a unique platform for knowledge sharing, networking, and collaboration within the semiconductor industry.

SPIE Advanced Lithography + Patterning 2025 in San Jose, California, USA, will bring together leading researchers, engineers, and industry professionals from around the globe to discuss and showcase the cutting-edge developments in optical lithography, EUV lithography, metrology, inspection, and emerging patterning techniques.

The SPIE Advanced Lithography + Patterning San Jose USA 2025 will feature a comprehensive technical program with presentations, tutorials, and workshops covering a wide range of topics, including:

• Optical Lithography: EUV lithography, immersion lithography, DUV lithography, resist materials, metrology, and process control.
• Emerging Lithography Technologies: Nanoimprint lithography, directed self-assembly, maskless lithography, and other novel patterning techniques.
• Computational Lithography: Design for manufacturability (DFM), process simulation, and computational lithography techniques.
• Metrology and Inspection: Advanced metrology techniques for critical dimension (CD) measurements, overlay control, and defect inspection.
• Materials Science: Novel materials for resists, masks, and other lithographic components.

This highly anticipated event provides a unique platform for attendees to:

• Learn about the latest breakthroughs: Engage with thought-provoking presentations and in-depth technical discussions on the most recent advancements in lithography and patterning technologies.
• Network with industry leaders: Connect with leading researchers, engineers, and industry professionals from academia, research institutions, and leading semiconductor companies.
• Explore cutting-edge technologies: Experience firsthand the latest innovations in lithography equipment, materials, and software through interactive exhibits and demonstrations.
• Gain valuable insights: Discover new challenges and opportunities in the semiconductor industry and gain valuable insights into the future of micro/nano-fabrication.

SPIE Advanced Lithography + Patterning offers a comprehensive program that includes:

• Technical sessions: Covering a wide range of topics such as optical lithography, EUV lithography, metrology, inspection, computational lithography, emerging patterning technologies, and more.
• Exhibition: Featuring the latest products and technologies from leading suppliers in the lithography and semiconductor industry.
• Networking events: Providing ample opportunities for attendees to connect with colleagues, potential collaborators, and industry leaders.
• Short courses: Offering in-depth training on specific topics related to advanced lithography and patterning.

The accompanying exhibition will showcase the latest products and technologies from leading equipment manufacturers, materials suppliers, and software developers. Attendees will have the opportunity to interact with industry experts, explore the latest innovations, and identify potential collaborations.

SPIE Advanced Lithography + Patterning San Jose provides a valuable forum for researchers, engineers, and industry professionals to stay at the forefront of technological advancements in micro/nanofabrication. By attending this event, participants can gain valuable insights, expand their professional networks, and contribute to the continued progress of the semiconductor industry.